Journal of Electron Spectroscopy and Related Phenomena (2005)

An X-ray photoelectron spectroscopy study of BaAl2S4 thin films
Philippe F. Smet, Jo E. Van Haecke, Roland Vanmeirhaeghe, Dirk Poelman
Journal of Electron Spectroscopy and Related Phenomena 148 (2005) 91-95

Abstract
Depth profiling with X-ray photoelectron spectroscopy (XPS) was used to study BaAl2S4:Eu thin films, which were prepared as a multi-layered stack of electron beam deposited BaS:Eu and Al2S3 thin films. A post-deposition thermal annealing at 900

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